Arrangement for generating pulsed currents with a high repetition rate and high current strength for gas discharge pumped radiation sources

• Main Authors: Korobochko, Vladimir, Bolshukhin, Denis, Dippmann, Lutz, Merz, Spencer, Von Bergmann, Hubertus, Kleinschmidt, Juergen
• Format: Patent
• Language: English
• Published: 04.07.2006

The invention is directed to an arrangement for generating pulsed currents for gas discharge pumped radiation sources, particularly with high repetition rates and high current strengths for generating plasma emitting EUV radiation. The object of the invention, to find a novel possibility for generating pulsed high-energy currents for a gas discharge pumped radiation source which permits a stable generation of high voltage and a reliable resetting of voltage using simple circuitry, is met according to the invention in that the charging circuit is an LC inversion charging circuit which communicates with a DC voltage source that provides only one half of the high voltage required for the gas discharge, wherein the inversion charging circuit has a capacitor bank with a first capacitor arranged directly parallel to the DC voltage source and a second capacitor which contributes after simultaneous charging to the recharging of the first capacitor by a triggered switch by a saturable recharging inductor for recharging the first capacitor, as a result of which the full high voltage required for discharging is provided in the capacitor bank.