Gating grid and method of making same

A gating grid for deflecting ions includes an insulating substrate, a conducting layer adhered to the insulating substrate, and interdigitated electrodes patterned in the conducting layer by a photolithographic process. A hole in the insulating substrate beneath the interdigitated electrodes allows...

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Bibliographic Details
Main Authors Charles, Jr, Harry K, Francomacaro, Arthur S, Keeney, Allen C, Lee, David M, Cornish, Timothy J
Format Patent
LanguageEnglish
Published 20.12.2005
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Summary:A gating grid for deflecting ions includes an insulating substrate, a conducting layer adhered to the insulating substrate, and interdigitated electrodes patterned in the conducting layer by a photolithographic process. A hole in the insulating substrate beneath the interdigitated electrodes allows ions to pass through the hole in the substrate. A process for making a gating grid for deflecting ions includes adhering a conducting layer to an insulating substrate, forming interdigitated electrodes on the conducting layer, and then forming a hole in the insulating substrate beneath the interdigitated electrodes.