Method for forming porous silica film

223222A method for forming a porous silica film having mechanical strength utilizeses a surfactant, one or more kinds of nonionic surfactant(s) having a 0.1 weight % concentration according to the Du Nouy method expression and a surface tension of 45 mN/m or larger at 25° C. is (are) used as a surfa...

Full description

Saved in:
Bibliographic Details
Main Authors Yamada, Kazuhiro, Fujii, Nobutoshi
Format Patent
LanguageEnglish
Published 20.09.2005
Online AccessGet full text

Cover

More Information
Summary:223222A method for forming a porous silica film having mechanical strength utilizeses a surfactant, one or more kinds of nonionic surfactant(s) having a 0.1 weight % concentration according to the Du Nouy method expression and a surface tension of 45 mN/m or larger at 25° C. is (are) used as a surfactant, a mixed solution obtained by mixing this nonionic surfactant, a hydrolyzable alkoxysilane compound, water and an alcohol is coated on the substrate, and the surfactant in this mixed solution is decomposed or burned out to form a porous silica film. The surfactant is suitably represented by formula OH(CHCHO)x(CH(CH)CHO)y(CHCHO)xH where x and y denote an integer satisfying 1≦x≦185 and 5≦y≦70, respectively. Alternatively, a mixed solution in which a dimethyldialkoxysilane is added may be used.