Method and apparatus for wet-cleaning substrate
An apparatus for wet cleaning a substrate includes a clean air supplier for supplying the clean air into a cleaning draft, a humidifier for supplying steam or mist like water drops into the cleaning draft, a hygrometer, connected to the humidifier and positioned at the level of the cleaning solution...
Saved in:
| Main Author | |
|---|---|
| Format | Patent |
| Language | English |
| Published |
06.09.2005
|
| Online Access | Get full text |
Cover
Loading…
| Summary: | An apparatus for wet cleaning a substrate includes a clean air supplier for supplying the clean air into a cleaning draft, a humidifier for supplying steam or mist like water drops into the cleaning draft, a hygrometer, connected to the humidifier and positioned at the level of the cleaning solution, an exhaust piping and an exhaust rate control means. |
|---|