Apparatus and method for monitoring and tuning an ion beam in ion implantation apparatus
An ion implanter has an ion source and an ion beam extraction assembly for extracting the ions. The extraction assembly is a tetrode structure and one of the pairs of extraction electrodes has left and right ports located in opposite sides of the ion beam emerging from the ion source. The left and r...
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Main Authors | , , , , |
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Format | Patent |
Language | English |
Published |
24.05.2005
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Online Access | Get full text |
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