Plasma monitoring method and semiconductor production apparatus

• Main Authors: Denda, Atsushi, Ito, Yoshinao
• Format: Patent
• Language: English
• Published: 22.02.2005

In certain embodiments a plasma is supplied from a plasma chamber into a reaction chamber of a plasma CVD apparatus. An electrode is disposed in the reaction chamber . A semiconductor wafer on which a thin film is to be formed is placed on the electrode . A radio-frequency wave is generated by a rad...