Light-curable resin composition having antistatic property

This application claims the benefit of Korean Patent Application No. 2002-21950, filed Apr. 22, 2002, in the Korean Intellectual Property Office, the disclosure of which is incorporated herein by reference. A light-curable resin composition includes an acrylate oligomer, an acrylate monomer having 4...

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Main Authors Chang, Do-hoon, Ro, Myong-do, Yoon, Du-seop, Park, In-sik
Format Patent
LanguageEnglish
Published 09.11.2004
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Summary:This application claims the benefit of Korean Patent Application No. 2002-21950, filed Apr. 22, 2002, in the Korean Intellectual Property Office, the disclosure of which is incorporated herein by reference. A light-curable resin composition includes an acrylate oligomer, an acrylate monomer having 4 or less functional groups, a photopolymerization initiator, a hardness enhancing agent represented by the formula(1), m-terphenyl represented by the formula(2) and a colloidal antistatic agent. The light-curable resin composition has a high antistatic property and a light transmittance, as well as a high hardness and a low shrinkage rate.