Method of eliminating agglomerate particles in a polishing slurry

This application is a continuation in part of U.S. patent application Ser. No. 09/083,072, filed on May 21, 1998, now U.S. Pat. No 6,024,829, entitled "A Method of Eliminating Agglomerate Particles in a Polishing Slurry" to Easter, et al., which is incorporated herein by reference. The pre...

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Bibliographic Details
Main Authors Crevasse, Annette M, Easter, William G, Maze, John A, Merchant, Sailesh M, Miceli, Frank
Format Patent
LanguageEnglish
Published 15.06.2004
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Summary:This application is a continuation in part of U.S. patent application Ser. No. 09/083,072, filed on May 21, 1998, now U.S. Pat. No 6,024,829, entitled "A Method of Eliminating Agglomerate Particles in a Polishing Slurry" to Easter, et al., which is incorporated herein by reference. The present invention, in one embodiment, provides a method for eliminating agglomerate particles in a polishing slurry. In this particular embodiment, the method is directed to reducing agglomeration of slurry particles within a waste slurry passing through a slurry system drain. The method comprises conveying the waste slurry to the drain, wherein the waste slurry may form an agglomerate having an agglomerate particle size. The method further comprises subjecting the waste slurry to energy emanating from an energy source. The energy source thereby transfers energy to the waste slurry to substantially reduce the agglomerate particle size. Substantially reduce means that the agglomerate is size is reduced such that the waste slurry is free to flow through the drain.