Wafer pedestal tilt mechanism

The invention relates generally to ion implanters for the manufacture of semiconductor wafers, and more particularly to a mechanism for tilting and twisting wafer support pedestals in batch-type ion implanters. The invention provides a wafer pad assembly and actuation system for use in an ion implan...

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Bibliographic Details
Main Authors Pharand, Michel, Weed, Allan D
Format Patent
LanguageEnglish
Published 27.04.2004
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Summary:The invention relates generally to ion implanters for the manufacture of semiconductor wafers, and more particularly to a mechanism for tilting and twisting wafer support pedestals in batch-type ion implanters. The invention provides a wafer pad assembly and actuation system for use in an ion implanter, preferably a batch-type ion implanter. The wafer pad assembly includes a rotatable wafer support pad having an upper surface for mounting the wafer, and a lower surface rotationally mounted to a housing of the wafer pad assembly. The lower surface of the wafer support pad further comprises a flange connected to a rotatable shaft. The shaft is connected to an actuator for selectively indexing the shaft so that the wafer support pad is rotationally indexed about its geometric center. The lower surface of the wafer support pad is also connected to a frame having an outer curved surface rotatably mounted within a mating bearing surface of a housing. The curved frame is connected to a plurality of linkages for moving the wafer support pad within the curved frame so that the wafer is pivotable or tiltable about its geometric center.