Mask for sputtering
1. Field of the Invention In a sputtering process of forming a transparent electrode film () on a color filter (), the dielectric breakdown of a peripheral portion of the color pattern film () due to abnormal discharge is prevented. A metal mask () has a mask body () provided with openings () having...
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| Main Authors | , |
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| Format | Patent |
| Language | English |
| Published |
29.04.2003
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| Online Access | Get full text |
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| Summary: | 1. Field of the Invention
In a sputtering process of forming a transparent electrode film () on a color filter (), the dielectric breakdown of a peripheral portion of the color pattern film () due to abnormal discharge is prevented. A metal mask () has a mask body () provided with openings () having a shape corresponding to that of the color pattern films () formed on a glass substrate () Stepped portions () are formed by recessing brim portions () of the openings () facing the color filters (). Gaps () are formed between the mask body () and peripheral portions of the color pattern films () of the color filters (). The mask body () is provided on the stepped portions () with conductive projections (). The conductive projections () come into electrical contact with black shading strips () formed in the peripheral portions of the color pattern films () of the color filters (). |
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