System and method for providing a lithographic light source for a semiconductor manufacturing process

This invention relates generally to photolithography in semiconductor manufacturing and more particularly to a system and method for providing a lithographic light source for a semiconductor manufacturing process. A method for providing a lithographic light source is provided that includes producing...

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Bibliographic Details
Main Authors Haas, Edwin G, Gutowski, Robert M, Calia, Vincent S
Format Patent
LanguageEnglish
Published 22.04.2003
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Summary:This invention relates generally to photolithography in semiconductor manufacturing and more particularly to a system and method for providing a lithographic light source for a semiconductor manufacturing process. A method for providing a lithographic light source is provided that includes producing a process fluid plume. A coaxial shielding fluid is produced around the process fluid plume. A plasma is generated by providing an energy source that impinges on the process fluid plume.