Method of generating extremely short-wave radiation, and extremely short-wave radiation source unit
The invention relates to a method of generating extremely short-wave radiation, in which a solid medium is transported through a vacuum space and each time a different part of the medium in the vacuum space is irradiated with a pulsed and focused energy-rich laser beam, said part of the medium being...
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| Format | Patent |
| Language | English |
| Published |
25.03.2003
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| Online Access | Get full text |
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| Summary: | The invention relates to a method of generating extremely short-wave radiation, in which a solid medium is transported through a vacuum space and each time a different part of the medium in the vacuum space is irradiated with a pulsed and focused energy-rich laser beam, said part of the medium being partly converted into a plasma emitting extremely short-wave radiation.
A method of generating EUV radiation is described, comprising the steps of:transporting a solid medium () through a source space () connected to a vacuum pump (), andirradiating a portion () of the medium with an intense, pulsed, laser beam () focused on said portion of the medium, thus creating a plasma () which emits EUV radiation.To increase the intensity of the EUV radiation and improve the possibility to collect particles () released from the medium, at least the medium portions () to be irradiated have a concave shape. The method can be improved by embedding the medium in a flow of rare gas.Also described are a EUV radiation source unit for realizing the method and the application of the method in the manufacture of devices such as IC devices, and in a lithographic projection apparatus. |
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