Fabrication method for semiconductor integrated circuit device

• Main Authors: Nakabayashi, Shinichi, Abe, Hisahiko, Ota, Katsuhiro
• Format: Patent
• Language: English
• Published: 04.02.2003

This invention relates to a technique for fabricating a semiconductor integrated circuit device; and, more particularly, the invention relates to a technique that is applicable to the fabrication of a semiconductor integrated circuit device, including the step of polishing a thin film formed on the...