Microlens formed of negative photoresist
This invention relates generally to microlens arrays for various applications including increasing the fill factor of photosensitive arrays. By forming a microlens of negative photoresist, economical microlens fabrication processes may be used which, in some embodiments, may achieve microlenses havi...
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| Format | Patent |
| Language | English |
| Published |
21.01.2003
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| Online Access | Get full text |
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| Summary: | This invention relates generally to microlens arrays for various applications including increasing the fill factor of photosensitive arrays.
By forming a microlens of negative photoresist, economical microlens fabrication processes may be used which, in some embodiments, may achieve microlenses having good optical clarity and high thermal stability. In one embodiment, a positive photoresist may be used as a pattern mask to transfer a pattern to the negative photoresist. The microlenses may be formed by dry etching the positive photoresist which acts as a mask to transfer a pattern to the underlying negative photoresist. At the same time a scratch protection layer may be formed over regions not overlying optical sensors. |
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