Method for patterning sensitive organic thin films

1. Field of the Invention A method for patterning a chemically sensitive organic thin film such as pentacene comprising (a) forming a protective material layer on the surface of a chemically sensitive organic thin film, said protective material layer being chemically resistant; (b) forming a photore...

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Bibliographic Details
Main Authors Dimitrakopoulos, Christos Dimitrios, Kymissis, Ioannis, Purushothaman, Sampath
Format Patent
LanguageEnglish
Published 31.12.2002
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Summary:1. Field of the Invention A method for patterning a chemically sensitive organic thin film such as pentacene comprising (a) forming a protective material layer on the surface of a chemically sensitive organic thin film, said protective material layer being chemically resistant; (b) forming a photoresist on an exposed surface of said protective material layer; (c) patterning the photoresist; and (d) transferring the pattern to the protective material layer and the chemically sensitive organic thin film by dry etching.