Substrate cleaning process

The present invention relates to cleaning a substrate. A substrate cleaning method comprises exposing a substrate to an energized process gas to remove residue 60 and resist material from the substrate In one version, the process gas comprises cleaning gas, such as an oxygen-containing gas, and an a...

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Bibliographic Details
Main Authors Kropewnicki, Thomas J, Pender, Jeremiah T, Fong, Henry, Auglis, Charles Peter, Hung, Raymond, Shan, Hongqing
Format Patent
LanguageEnglish
Published 27.08.2002
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Summary:The present invention relates to cleaning a substrate. A substrate cleaning method comprises exposing a substrate to an energized process gas to remove residue 60 and resist material from the substrate In one version, the process gas comprises cleaning gas, such as an oxygen-containing gas, and an additive gas, such as NH. In one version, the process gas is introduced to remove residue and resist material from the substrate and to remove residue from surfaces in the process chamber