Apparatus for mounting a rotational disk
The present invention generally relates to an apparatus and a method for mounting a rotational disk and more particularly, relates to an apparatus and a method for mounting a conditioning disk onto a conditioning head for use in a chemical mechanical polishing apparatus that is capable of preventing...
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| Format | Patent |
| Language | English |
| Published |
09.04.2002
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| Online Access | Get full text |
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| Summary: | The present invention generally relates to an apparatus and a method for mounting a rotational disk and more particularly, relates to an apparatus and a method for mounting a conditioning disk onto a conditioning head for use in a chemical mechanical polishing apparatus that is capable of preventing slurry from being siphoned into the control system.
An apparatus and a method for mounting a conditioning disk to a conditioning head for use in a chemical mechanical polishing apparatus. A torroidal-shaped bearing mount is fixedly mounted to a conditioning arm of the CMP apparatus for receiving a ball bearing and a cylinder rotator. A cylinder shaft is mounted inside a cylinder chamber defined by the cylinder rotator and is further equipped with a piston mounted at near a top end of the shaft which has an elastomeric gasket mounted on an outer rim for sealingly engaging a sidewall in the cylinder chamber. A disk holder is mounted to a bottom end of the cylinder shaft by a universal connector/universal mount such that the disk holder, with a conditioning disk mounted thereon, can be operated to follow a contour of the polishing disk by tilting to an angle of at least ±30° from a horizontal plane. |
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