Removing contaminations due to polymer aggregation in photoresist
An embodiment of the present invention includes a technique to remove a contaminant from a resist. A resist having a resist volume is spun in a centrifuige tube of a centrifuge at a pre-defined spinning rate corresponding to the resist volume in a time period to provide a gel. The gel is located und...
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| Main Authors | , |
|---|---|
| Format | Patent |
| Language | English |
| Published |
30.12.2004
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| Online Access | Get full text |
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| Abstract | An embodiment of the present invention includes a technique to remove a contaminant from a resist. A resist having a resist volume is spun in a centrifuige tube of a centrifuge at a pre-defined spinning rate corresponding to the resist volume in a time period to provide a gel. The gel is located under a lighting condition. The resist is decanted from the centrifuge tube. |
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| AbstractList | An embodiment of the present invention includes a technique to remove a contaminant from a resist. A resist having a resist volume is spun in a centrifuige tube of a centrifuge at a pre-defined spinning rate corresponding to the resist volume in a time period to provide a gel. The gel is located under a lighting condition. The resist is decanted from the centrifuge tube. |
| Author | Deng, Hai Choi, Hok-Kin |
| Author_xml | – sequence: 1 givenname: Hok-Kin surname: Choi fullname: Choi, Hok-Kin – sequence: 1 givenname: Hai surname: Deng fullname: Deng, Hai |
| BookMark | eNqVjLsKAjEQAFNo4esftrUQ4nlcL6JYi_2xnGsMJLshuyf494L6A1ZTzDBzN2Fhmrn9hbI8IwcYhA1zZLQorHAbCUygSHplqoAhVAofB5GhPMSkkka1pZveMSmtfly49el4PZw3oxY0YtMeS0lx-I77xvvWN13nt-3un_YNXpo7Qg |
| ContentType | Patent |
| DBID | EFI |
| DatabaseName | USPTO Published Applications |
| DatabaseTitleList | |
| Database_xml | – sequence: 1 dbid: EFI name: USPTO Published Applications url: http://www.uspto.gov/patft/index.html sourceTypes: Open Access Repository |
| DeliveryMethod | fulltext_linktorsrc |
| ExternalDocumentID | 20040266014 |
| GroupedDBID | EFI |
| ID | FETCH-uspatents_applications_200402660143 |
| IEDL.DBID | EFI |
| IngestDate | Sun Mar 05 22:32:03 EST 2023 |
| IsOpenAccess | true |
| IsPeerReviewed | false |
| IsScholarly | false |
| Language | English |
| LinkModel | DirectLink |
| MergedId | FETCHMERGED-uspatents_applications_200402660143 |
| OpenAccessLink | https://patentcenter.uspto.gov/applications/10611029 |
| ParticipantIDs | uspatents_applications_20040266014 |
| PublicationCentury | 2000 |
| PublicationDate | 20041230 |
| PublicationDateYYYYMMDD | 2004-12-30 |
| PublicationDate_xml | – month: 12 year: 2004 text: 20041230 day: 30 |
| PublicationDecade | 2000 |
| PublicationYear | 2004 |
| Score | 2.6132703 |
| Snippet | An embodiment of the present invention includes a technique to remove a contaminant from a resist. A resist having a resist volume is spun in a centrifuige... |
| SourceID | uspatents |
| SourceType | Open Access Repository |
| Title | Removing contaminations due to polymer aggregation in photoresist |
| URI | https://patentcenter.uspto.gov/applications/10611029 |
| hasFullText | 1 |
| inHoldings | 1 |
| isFullTextHit | |
| isPrint | |
| link | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwY2BQsTBNTLYwMEnSNU8zSdY1MU0F3QZomqibmJJkYJxiamCUmgwa0Pf1M_MINfGKMI2AbgoD7YUpALaw8kpACxNTi_RKiwtK8sGrK1Fmc0G9GGC9aMnMwAzMy6AmkJsnNwMnUDVYczFSBeEmyMAWABYVYmBKzRNhcAxKzQV31RVAS8ETQctNwIYqpJSmKpTkKxTk51TmphYpJKYDu7vpYDmFzDyFgox8YBc4tRgY9KIMmm6uIc4eunD74pFdB7rXEdgnMzMDHZwnxsAC7MSnSjAoGBsbGKQlmyQbJQP7P5ZpSYlpwJZGahqwekgxByJLSQYlwuZJEaNImoELfhihgQwDS0lRaaossOIsSZIDhxQAN-F56Q |
| link.rule.ids | 230,309,783,876,888,64387 |
| linkProvider | USPTO |
| linkToPdf | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwjV1LS8QwEB50FR8nRcW3Qbx4iIZt6naPopZdH0sRhb2VNI9V2KZl2yL-eydZWXpTyCkJk5CPZOZLZiYAF1EoZMR4RnuGS8pD7X4DDAUVKmOBCllXS3eh_zK6Gbzzx3E4_g2P9rEwOW4jWuJcqqumKuvCO1fi8T4Hns6TP7scgdZlH_iy00KoRJlrhzbyCeQXfBlWUM9GnpbFw01YR0FouNm6aqmOeAtWE1-7DUva7sDtq849iSfOSVw4RxSPPFGNJnVBymL6nesZERMkwhPfRj4tKT8KJMe6QlB24TJ-eLsb0MV4afsVOm1NMdiDDtJ7vQ8kCBgzksuuRGbUN5kwaINog4pD9bD0D-D8b3mH_-l0BmvJfZw-D0dPR7CxyFjIjqFTzxp9gtq1zk79ov0ARpiFMQ |
| openUrl | ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=Removing+contaminations+due+to+polymer+aggregation+in+photoresist&rft.inventor=Choi%2C+Hok-Kin&rft.inventor=Deng%2C+Hai&rft.date=2004-12-30&rft.externalDBID=n%2Fa&rft.externalDocID=20040266014 |