Removing contaminations due to polymer aggregation in photoresist
An embodiment of the present invention includes a technique to remove a contaminant from a resist. A resist having a resist volume is spun in a centrifuige tube of a centrifuge at a pre-defined spinning rate corresponding to the resist volume in a time period to provide a gel. The gel is located und...
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| Main Authors | , |
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| Format | Patent |
| Language | English |
| Published |
30.12.2004
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| Online Access | Get full text |
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| Summary: | An embodiment of the present invention includes a technique to remove a contaminant from a resist. A resist having a resist volume is spun in a centrifuige tube of a centrifuge at a pre-defined spinning rate corresponding to the resist volume in a time period to provide a gel. The gel is located under a lighting condition. The resist is decanted from the centrifuge tube. |
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