Positive type radiosensitive composition and method for forming pattern

A positive-tone radiation-sensitive composition including: (A) at least one compound selected from the group consisting of a hydrolyzable silane compound represented by general formula (R 1 ) p Si(X) 4-p (wherein R 1 is a non-hydrolyzable organic group having 1 to 12 carbon atoms, X is a hydrolyzabl...

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Bibliographic Details
Main Authors Tamaki, Kentarou, Utaka, Tomohiro, Nishikawa, Akira
Format Patent
LanguageEnglish
Published 07.10.2004
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Summary:A positive-tone radiation-sensitive composition including: (A) at least one compound selected from the group consisting of a hydrolyzable silane compound represented by general formula (R 1 ) p Si(X) 4-p (wherein R 1 is a non-hydrolyzable organic group having 1 to 12 carbon atoms, X is a hydrolyzable group, and p is an integer from 0 to 3), hydrolyzates thereof and condensates thereof; (B) a photoacid generator; and (C) a basic compound. A cured product that is excellent in terms of pattern precision and so on can be obtained by using the composition. The composition can be used as a material for forming optical waveguides.