Plasma processing apparatus and plasma processing method

A plasma processing apparatus includes a chamber in which a plate to be processed is contained, an introductory port via which a hydrogen-atom-containing gas is guided into the chamber, a lower electrode on which the plate is laid in the chamber, an upper electrode disposed opposite to the lower ele...

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Bibliographic Details
Main Authors Ohuchi, Junko, Ohiwa, Tokuhisa
Format Patent
LanguageEnglish
Published 29.07.2004
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Summary:A plasma processing apparatus includes a chamber in which a plate to be processed is contained, an introductory port via which a hydrogen-atom-containing gas is guided into the chamber, a lower electrode on which the plate is laid in the chamber, an upper electrode disposed opposite to the lower electrode and causing electric discharge in the chamber to produce a plasma, a power supply which supplies voltage between the lower and upper electrodes, and a metal oxide structural body disposed in a part in the chamber, the metal oxide structural body being reduced when the hydrogen-atom-containing gas is introduced.