METHOD FOR LOW TEMPERATURE LIQUID-PHASE DEPOSITION AND METHOD FOR CLEANING LIQUID-DEPOSITION APPARATUS

A method for low temperature liquid-phase deposition and a method for cleaning a liquid-phase deposition apparatus are disclosed. The method for low temperature liquid-phase deposition is employed so as to form a low-temperature grown film or a film with excellent step-coverage on the surface of a s...

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Bibliographic Details
Main Authors Liang, Muh-Wang, Chang, Edward, Chiang, Shih-Ming, Tseng, Chih-Yuan, Chiang, Pang-Min
Format Patent
LanguageEnglish
Published 15.07.2004
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Summary:A method for low temperature liquid-phase deposition and a method for cleaning a liquid-phase deposition apparatus are disclosed. The method for low temperature liquid-phase deposition is employed so as to form a low-temperature grown film or a film with excellent step-coverage on the surface of a semiconductor device having independent circuit functions. The method for cleaning liquid-phase deposition apparatus is characterized in that a loop used exclusively for cleaning is employed so as to prevent SiO 2 powders from remaining in the loop.