Cleaning solution for removing damaged portion of ferroelectric layer and cleaning method using the same

A cleaning solution for use in removing a damaged portion of a ferroelectric layer, and a cleaning method using the solution. The cleaning solution includes a fluoride, an organic acid with carboxyl group, an alkaline pH adjusting agent and water.

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Bibliographic Details
Main Authors Lee, Kwang-Wook, Park, Im-Soo, Lee, Kun-Tack, Kwon, Young-Min, Hah, Sang-Rok
Format Patent
LanguageEnglish
Published 17.06.2004
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Summary:A cleaning solution for use in removing a damaged portion of a ferroelectric layer, and a cleaning method using the solution. The cleaning solution includes a fluoride, an organic acid with carboxyl group, an alkaline pH adjusting agent and water.