OVERLAY REGISTRATION CORRECTION METHOD FOR MULTIPLE PRODUCT TYPE MICROELECTRONIC FABRICATION FOUNDRY FACILITY

A method for determining an overlay registration correction for a new product lot of a microelectronic product type with respect to a specific alignment tool within a foundry facility first provides for determining: (1) a first average historic overlay registration correction for historic product lo...

Full description

Saved in:
Bibliographic Details
Main Authors Wu, Wen-Hung, Cheng, Kun-Pi
Format Patent
LanguageEnglish
Published 13.05.2004
Online AccessGet full text

Cover

More Information
Summary:A method for determining an overlay registration correction for a new product lot of a microelectronic product type with respect to a specific alignment tool within a foundry facility first provides for determining: (1) a first average historic overlay registration correction for historic product lots of the new product lot type with respect to the specific alignment tool; and (2) a second average historic overlay registration correction with respect to product lots of any product type with respect to the specific alignment tool. The overlay registration correction is determined as the sum of: (1) an overlay registration correction for an immediately preceding layer within the new product lot, if present; (2) a factor derived from the first average historic overlay registration correction; and (3) a factor derived from the second average historic overlay registration correction.