Resist composition
A negative type resist composition comprising: (A1) a compound generating a sulfonic acid upon irradiation with actinic rays or a radiation and having the specific formula, (A2) a compound generating a sulfonic acid upon irradiation with actinic rays or a radiation and having the specific structure,...
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| Main Authors | , , |
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| Format | Patent |
| Language | English |
| Published |
25.03.2004
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| Online Access | Get full text |
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| Summary: | A negative type resist composition comprising:
(A1) a compound generating a sulfonic acid upon irradiation with actinic rays or a radiation and having the specific formula,
(A2) a compound generating a sulfonic acid upon irradiation with actinic rays or a radiation and having the specific structure,
(B) an alkali-soluble resin, and
(C) a crosslinking agent capable of carrying out an addition reaction with the alkali-soluble resin which is the component (B) by the action of an acid. |
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