Resist composition comprising photosensitive polymer having lactone in its backbone

A resist composition includes a photosensitive polymer having a lactone in its backbone. The photosensitive polymer of the resist composition includes at least one of the monomers having the formulae: 1 where R 1 and R 2 are independently a hydrogen atom, alkyl, hydroxyalkyl, alkyloxy, carbonyl or e...

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Bibliographic Details
Main Authors Yoon, Kwang-Sub, Jung, Dong-Won, Lee, Si-Hyeung, Kim, Hyun-Woo, Lee, Sook, Woo, Sang-Gyun, Choi, Sang-Jun
Format Patent
LanguageEnglish
Published 29.01.2004
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Summary:A resist composition includes a photosensitive polymer having a lactone in its backbone. The photosensitive polymer of the resist composition includes at least one of the monomers having the formulae: 1 where R 1 and R 2 are independently a hydrogen atom, alkyl, hydroxyalkyl, alkyloxy, carbonyl or ester, and x, y, v and w are independently integers from 1 to 6.