Substrate processing method and substrate processing apparatus
An object of the present invention is to form an interlayer insulating film on a substrate and cure the interlayer insulating film in a time shorter than that in the prior art. The present invention is a substrate processing method in which the interlayer insulating film formed on the substrate is i...
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| Main Authors | , |
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| Format | Patent |
| Language | English |
| Published |
22.01.2004
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| Online Access | Get full text |
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| Summary: | An object of the present invention is to form an interlayer insulating film on a substrate and cure the interlayer insulating film in a time shorter than that in the prior art. The present invention is a substrate processing method in which the interlayer insulating film formed on the substrate is irradiated with electron beams in a processing chamber, whereby the interlayer insulating film is cured. |
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