Polymers, resist compositions and patterning process

A resist composition comprising a base polymer having sulfone or sulfonate units introduced therein is sensitive to high-energy radiation below 300 nm, is endowed with excellent adherence to substrates while maintaining transparency, and is suited for lithographic microprocessing.

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Bibliographic Details
Main Authors Hatakeyama, Jun, Harada, Yuji, Sasago, Masaru, Endo, Masayuki, Kishimura, Shinji
Format Patent
LanguageEnglish
Published 20.11.2003
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Summary:A resist composition comprising a base polymer having sulfone or sulfonate units introduced therein is sensitive to high-energy radiation below 300 nm, is endowed with excellent adherence to substrates while maintaining transparency, and is suited for lithographic microprocessing.