Polymers, resist compositions and patterning process
A resist composition comprising a base polymer having sulfone or sulfonate units introduced therein is sensitive to high-energy radiation below 300 nm, is endowed with excellent adherence to substrates while maintaining transparency, and is suited for lithographic microprocessing.
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Main Authors | , , , , |
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Format | Patent |
Language | English |
Published |
20.11.2003
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Online Access | Get full text |
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Summary: | A resist composition comprising a base polymer having sulfone or sulfonate units introduced therein is sensitive to high-energy radiation below 300 nm, is endowed with excellent adherence to substrates while maintaining transparency, and is suited for lithographic microprocessing. |
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