Micromechanical structure, in particular for an acceleration sensor or yaw rate sensor and a corresponding method for producing the same
A micromechanical structure and a corresponding manufacturing method are described. The structure includes a substrate ( 10 ), which has an anchoring device ( 20 ), and a centrifugal mass ( 30 ), which is connected to the anchoring device ( 20 ) via a flexible spring device ( 40 ), so that the centr...
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| Main Authors | , , , , |
|---|---|
| Format | Patent |
| Language | English |
| Published |
26.06.2003
|
| Online Access | Get full text |
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| Summary: | A micromechanical structure and a corresponding manufacturing method are described. The structure includes a substrate (
10
), which has an anchoring device (
20
), and a centrifugal mass (
30
), which is connected to the anchoring device (
20
) via a flexible spring device (
40
), so that the centrifugal mass (
30
) is elastically deflectable from its rest position. The centrifugal mass (
30
) has clearances and is designed to be deflectable by etching a sacrificial layer (
50
) underneath it. The sacrificial layer (
50
) is present in a first area located underneath the centrifugal mass (
30
) with a first etchable thickness (d
1
), and in a second area located underneath the centrifugal mass (
30
) with a second etchable thickness (d
1
+d
2+
d
3
), the second thickness being greater than the first thickness (d
1
). The centrifugal mass (
30
) is structured in the first area so that in etching only a maximum of two etching fronts may come together in order to limit the etching residue deposits. |
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