Pattern formation material and pattern formation method
A pattern formation material of this invention contains a base polymer including a unit represented by Chemical Formula 1 and an acid generator: 1 wherein R 1 is a protecting group released by an acid.
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Main Authors | , , , , |
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Format | Patent |
Language | English |
Published |
15.05.2003
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Online Access | Get full text |
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Summary: | A pattern formation material of this invention contains a base polymer including a unit represented by Chemical Formula 1 and an acid generator:
1
wherein R
1
is a protecting group released by an acid. |
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