Pattern formation material and pattern formation method

A pattern formation material of this invention contains a base polymer including a unit represented by Chemical Formula 1 and an acid generator: 1 wherein R 1 is a protecting group released by an acid.

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Bibliographic Details
Main Authors Kishimura, Shinji, Endo, Masayuki, Sasago, Masaru, Ueda, Mitsuru, Fujigaya, Tsuyohiko
Format Patent
LanguageEnglish
Published 15.05.2003
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Summary:A pattern formation material of this invention contains a base polymer including a unit represented by Chemical Formula 1 and an acid generator: 1 wherein R 1 is a protecting group released by an acid.