Polymer debris pre-cleaning method

A polymer debris pre-cleaning method is described. The method provides a specific gas mixture after an etching process that uses a fluorocarbon reacting gas. The plasma generated from the gas mixture is then used to perform a pre-cleaning of the polymer debris. The gas mixture of specific gases is s...

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Bibliographic Details
Main Authors Wu, Yann-Pyng, Ho, Yueh-Feng, Sun, Gow-Wei, Hung, Jen-Ku
Format Patent
LanguageEnglish
Published 30.01.2003
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Summary:A polymer debris pre-cleaning method is described. The method provides a specific gas mixture after an etching process that uses a fluorocarbon reacting gas. The plasma generated from the gas mixture is then used to perform a pre-cleaning of the polymer debris. The gas mixture of specific gases is selected from the group of an oxygen and nitrogen gas mixture, a hydrogen and argon gas mixture, an argon and nitrogen gas mixture, or an oxygen and argon gas mixture. Since the plasma generated from the gas mixture softens, burns or even removes the hardened polymer debris, the polymer debris can be completely removed in the subsequent cleaning process. The duration of the subsequent cleaning process is thus reduced.