Forming a pattern of a negative photoresist

A new group of non-chemically amplified negative tone water/aqueous base developable (photo) resists based on redistribution of carbon-oxygen bonds in pendant ester groups of the polymers has been found.

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Bibliographic Details
Main Authors Babich, Edward, Angelopoulos, Marie, Babich, Inna, Babich, Katherina, Bucchignano, James, Petrillo, Karen, Rishton, Steven
Format Patent
LanguageEnglish
Published 05.09.2002
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Summary:A new group of non-chemically amplified negative tone water/aqueous base developable (photo) resists based on redistribution of carbon-oxygen bonds in pendant ester groups of the polymers has been found.