TIN - COPPER ALLOY ELECTROPLATING BATH AND PLATING PROCESS THEREWITH
A tin-copper alloy electroplating bath which comprises a water-soluble tin salt, a water-soluble copper salt, an inorganic or organic acid or a water-soluble salt thereof, and one or more compounds selected from thioamide compounds and thiol compounds. The present invention makes it possible to form...
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Main Authors | , , , , |
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Format | Patent |
Language | English |
Published |
08.08.2002
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Abstract | A tin-copper alloy electroplating bath which comprises a water-soluble tin salt, a water-soluble copper salt, an inorganic or organic acid or a water-soluble salt thereof, and one or more compounds selected from thioamide compounds and thiol compounds. The present invention makes it possible to form a tin-copper alloy deposit, in place of tin-lead alloy plating, on electronic parts such as chips, quartz crystal oscillators, hoops, connector pins, lead frames, bumps, lead pins of packages, and printed circuit boards. |
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AbstractList | A tin-copper alloy electroplating bath which comprises a water-soluble tin salt, a water-soluble copper salt, an inorganic or organic acid or a water-soluble salt thereof, and one or more compounds selected from thioamide compounds and thiol compounds. The present invention makes it possible to form a tin-copper alloy deposit, in place of tin-lead alloy plating, on electronic parts such as chips, quartz crystal oscillators, hoops, connector pins, lead frames, bumps, lead pins of packages, and printed circuit boards. |
Author | TSUBOKURA, HIDEYUKI OKA, TERUYA TSUJIMOTO, MASANOBU YANADA, ISAMU OKADA, TETSUROU |
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Title | TIN - COPPER ALLOY ELECTROPLATING BATH AND PLATING PROCESS THEREWITH |
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