Standard for a nanotopography unit, and a method for producing the standard

A standard for calibrating and checking a nanotopography unit, includes a substrate and at least one structure which is deposited on the substrate. It has a lateral extent of 0.5 to 20 mm and a vertical extent of 5 to 500 nm and is bounded by edges which have a gradient of at most 1*10 −3 . There is...

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Bibliographic Details
Main Authors Schauer, Reinhard, Passek, Friedrich, Schmolke, Rudiger, Kumpe, Ralf
Format Patent
LanguageEnglish
Published 15.11.2001
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Summary:A standard for calibrating and checking a nanotopography unit, includes a substrate and at least one structure which is deposited on the substrate. It has a lateral extent of 0.5 to 20 mm and a vertical extent of 5 to 500 nm and is bounded by edges which have a gradient of at most 1*10 −3 . There is also a method for producing the standard, with material being deposited on the substrate at an inhomogeneous deposition rate.