METHOD FOR DEPOSITION BY SPUTTERING, RESULTING PRODUCT, AND SPUTTERING TARGET
The subject of the invention is a process for obtaining a substrate coated with a photocatalytic film based on a mixed oxide of bismuth and at least one metal other than bismuth, comprising at least a step of depositing said oxide by a sputtering technique.
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| Format | Patent |
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| Language | English |
| Published |
08.07.2010
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| Online Access | Get full text |
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| Summary: | The subject of the invention is a process for obtaining a substrate coated with a photocatalytic film based on a mixed oxide of bismuth and at least one metal other than bismuth, comprising at least a step of depositing said oxide by a sputtering technique. |
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