Near-infrared responsive magnetic photocatalyst based on NaYF:Yb/Er@CuO@MoS@FeO for the efficient degradation of organic contaminants
In the realm of photocatalysis, effectively utilizing solar energy, especially the near-infrared (NIR) spectrum, presents substantial challenges. To tackle this issue, a novel composite of NaYF 4 :Yb 3+ /Er 3+ @Cu 2 O@MoS 2 @Fe 3 O 4 (denoted as NYE@Cu 2 O@MoS 2 @Fe 3 O 4 ) was ingeniously fabricate...
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Published in | New journal of chemistry Vol. 48; no. 17; pp. 7688 - 7698 |
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Main Authors | , , , , , , , , |
Format | Journal Article |
Published |
29.04.2024
|
Online Access | Get full text |
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Summary: | In the realm of photocatalysis, effectively utilizing solar energy, especially the near-infrared (NIR) spectrum, presents substantial challenges. To tackle this issue, a novel composite of NaYF
4
:Yb
3+
/Er
3+
@Cu
2
O@MoS
2
@Fe
3
O
4
(denoted as NYE@Cu
2
O@MoS
2
@Fe
3
O
4
) was ingeniously fabricated and assessed for the photodegradation of organic contaminants. By harnessing the distinct properties of upconversion materials, narrow bandgap semiconductors, and magnetic substances, the NYE@Cu
2
O@MoS
2
@Fe
3
O
4
catalyst possesses a photodegradation rate of 92% for the rhodamine B dye under NIR light radiation, which is superior to NYE@Cu
2
O (50%) and NYE@Cu
2
O@MoS
2
(85%). The enhanced performance in the near-infrared photocatalysis of NYE@Cu
2
O@MoS
2
@Fe
3
O
4
is mainly attributed to the synergistic effect of various components, which promotes an increase in photo-induced carrier generation and facilitates their efficient transfer and energy utilization under NIR irradiation. This study provides a possible route for the near-infrared photocatalytic degradation of pollutants in areas with limited light or even dark conditions.
In the realm of photocatalysis, effectively utilizing solar energy, especially the near-infrared (NIR) spectrum, presents substantial challenges. |
---|---|
Bibliography: | https://doi.org/10.1039/d4nj00415a Electronic supplementary information (ESI) available. See DOI |
ISSN: | 1144-0546 1369-9261 |
DOI: | 10.1039/d4nj00415a |