First-principles study on electronic states of InSe/Au heterostructure controlled by strain engineering
The development of low-dimensional multifunctional devices has become increasingly important as the size of field-effect transistors decreases. In recent years, the two-dimensional (2D) semiconductor In 2 Se 3 has emerged as a promising candidate for applications in the fields of electronics and opt...
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Published in | RSC advances Vol. 13; no. 17; pp. 11385 - 11392 |
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Main Authors | , , , , , , , |
Format | Journal Article |
Published |
11.04.2023
|
Online Access | Get full text |
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Summary: | The development of low-dimensional multifunctional devices has become increasingly important as the size of field-effect transistors decreases. In recent years, the two-dimensional (2D) semiconductor In
2
Se
3
has emerged as a promising candidate for applications in the fields of electronics and optoelectronics owing to its remarkable spontaneous polarization properties. Through first-principles calculations, the effects of the polarization direction and biaxial tensile strain on the electronic and contact properties of In
2
Se
3
/Au heterostructures are investigated. The contact type of In
2
Se
3
/Au heterostructures depends on the polarization direction of In
2
Se
3
. The more charge transfers from the metal to the space charge region, the biaxial tensile strain increases. Moreover, the upward polarized In
2
Se
3
in contact with Au maintains a constant n-type Schottky contact as the biaxial tensile strain increases, with a barrier height
Φ
SB,n
of only 0.086 eV at 6% strain, which is close to ohmic contact. On the other hand, the downward polarized In
2
Se
3
in contact with Au can be transformed from p-type to n-type by applying a biaxial tensile strain. Our calculation results can provide a reference for the design and fabrication of In
2
Se
3
-based field effect transistors.
The development of low-dimensional multifunctional devices has become increasingly important as the size of field-effect transistors decreases. |
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Bibliography: | https://doi.org/10.1039/d3ra00134b Electronic supplementary information (ESI) available. See DOI |
ISSN: | 2046-2069 |
DOI: | 10.1039/d3ra00134b |