A durable VO transition layer and defect inactivation in BiVO spontaneous valence-charge control
The performance of bismuth vanadate (BiVO 4 ) photoanodes is limited by surface defects and photo-corrosion instability. This paper proposes a revolutionary protection layer that overcomes these problems. Considering the role of V 5+ ion dissolution in photo-corrosion, we propose a surface photoelec...
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Published in | Journal of materials chemistry. A, Materials for energy and sustainability Vol. 1; no. 4; pp. 213 - 21314 |
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Main Authors | , , , , , , |
Format | Journal Article |
Published |
18.10.2022
|
Online Access | Get full text |
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Summary: | The performance of bismuth vanadate (BiVO
4
) photoanodes is limited by surface defects and photo-corrosion instability. This paper proposes a revolutionary protection layer that overcomes these problems. Considering the role of V
5+
ion dissolution in photo-corrosion, we propose a surface photoelectrochemical oxidation approach, artificially altering photo-corrosion to advanced photo-oxidation by strategically adding V
5+
and H
2
O
2
to the electrolyte. The surface phase transition thus induced creates an unprecedented vanadium oxide (VO
2
) photoelectrochemical protection layer that is robust, conductive, and ultrathin, while exhibiting atomic controllability. Charge-kinetic characterization of the BiVO
4
/VO
2
photoanodes revealed faster transport of interfacial charges (86%) and transfer of photogenerated carriers through the VO
2
protection layer (95%); this approach affords near-ideal performance and contributes toward high stability and extreme durability. The BiVO
4
/VO
2
/CoFeO
x
photoanodes displayed a high photocurrent density of 6.2 mA cm
−2
and an onset potential of 0.25 V
RHE
, with an applied bias photon-to-current efficiency of 2.4% at 0.62 V
RHE
.
Formation of a durable VO
2
transition protection layer and defect inactivation in BiVO
4
via
spontaneous valence-charge control. |
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Bibliography: | https://doi.org/10.1039/d2ta05260a Electronic supplementary information (ESI) available. See |
ISSN: | 2050-7488 2050-7496 |
DOI: | 10.1039/d2ta05260a |