Site-selective growth of metal-organic frameworks using an interfacial growth approach combined with VUV photolithographyElectronic supplementary information (ESI) available: Experimental procedure; AFM analysis of resist pattern; XRD pattern of obtained samples; EDX mapping images of obtained samples. See DOI: 10.1039/c6ra18340a

We report a unique method for the site-selective growth of metal-organic frameworks (MOFs). The site-selective growth of MOFs can be achieved by fabricating a pattern of polymer photoresist on the metal-ion-doped polymer substrate and then constructing frameworks by immersion in an organic ligand so...

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Main Authors Tsuruoka, Takaaki, Matsuyama, Tetsuhiro, Miyanaga, Ayumi, Ohhashi, Takashi, Takashima, Yohei, Akamatsu, Kensuke
Format Journal Article
Published 15.08.2016
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Summary:We report a unique method for the site-selective growth of metal-organic frameworks (MOFs). The site-selective growth of MOFs can be achieved by fabricating a pattern of polymer photoresist on the metal-ion-doped polymer substrate and then constructing frameworks by immersion in an organic ligand solution. A novel approach combined with interfacial growth and photolithography has been developed for the site-selective growth of MOF crystals.
Bibliography:Electronic supplementary information (ESI) available: Experimental procedure; AFM analysis of resist pattern; XRD pattern of obtained samples; EDX mapping images of obtained samples. See DOI
10.1039/c6ra18340a
ISSN:2046-2069
DOI:10.1039/c6ra18340a