Synthesis and spectral properties of double D-π-A mono-cyanines as well as preparation of near infrared silicon-based materialsElectronic supplementary information (ESI) available. See DOI: 10.1039/c5ra08759g
Three kinds of new double D-π-A mono-cyanines D1 , D2 and D3 were synthesized for the surface modification of monocrystalline silicon to prepare near infrared silicon-based materials. There was a strong surface photovoltage response in the range of 900-1250 nm compared with silicon materials when do...
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Main Authors | , , , , |
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Format | Journal Article |
Language | English |
Published |
31.07.2015
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Online Access | Get full text |
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Summary: | Three kinds of new double D-π-A mono-cyanines
D1
,
D2
and
D3
were synthesized for the surface modification of monocrystalline silicon to prepare near infrared silicon-based materials. There was a strong surface photovoltage response in the range of 900-1250 nm compared with silicon materials when double D-π-A mono-cyanines were bound on the monocrystalline silicon material surface. To explore the effect of the double D-π-A mono-cyanines on the light absorption characteristics of silicon materials, the absorption properties, films on monocrystalline silicon surfaces and the surface photovoltage response of three double D-π-A mono-cyanines were investigated. The results demonstrated that the order of the intensity of the surface photovoltage response was Si/
D3
> Si/
D2
> Si/
D1
, and no absorption properties of the silicon materials in the near infrared region were improved, yielding near infrared silicon-based materials.
Three kinds of new double D-π-A mono-cyanines were synthesized for the surface modification of monocrystalline silicon. The prepared materials had a strong surface photovoltage response in the range 900-1250 nm. |
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Bibliography: | 10.1039/c5ra08759g Electronic supplementary information (ESI) available. See DOI |
ISSN: | 2046-2069 |
DOI: | 10.1039/c5ra08759g |