Quantum chemical and solution phase evaluation of metallocenes as reducing agents for the prospective atomic layer deposition of copperElectronic supplementary information (ESI) available. See DOI: 10.1039/C5DT00922G

• Main Authors: Dey, Gangotri, Wrench, Jacqueline S, Hagen, Dirk J, Keeney, Lynette, Elliott, Simon D
• Format: Journal Article
• Language: English
• Published: 27.05.2015
• ISSN: 1477-9226; 1477-9234
• DOI: 10.1039/c5dt00922g

We propose and evaluate the use of metallocene compounds as reducing agents for the chemical vapour deposition (and specifically atomic layer deposition, ALD) of the transition metal Cu from metalorganic precursors. Ten different transition metal cyclopentadienyl compounds are screened for their utility in the reduction of Cu from five different Cu precursors by evaluating model reaction energies with density functional theory (DFT) and solution phase chemistry. We propose and evaluate the use of metallocene compounds as reducing agents for the chemical vapour deposition (and specifically atomic layer deposition, ALD) of the transition metal Cu from metalorganic precursors.