Microwave assisted formation of monoreactive perfluoroalkylsilane-based self-assembled monolayersElectronic supplementary information (ESI) available: Experimental methods, AFM images of clean silicon substrate, XPS survey scan. See DOI: 10.1039/c4cc07494g

We demonstrate the use of microwave radiation as a tool to accelerate the formation of perfluoroalkylsilane based self-assembled monolayers (SAMs) on silicon oxide surfaces. Surface coverage of these SAMs of monoreactive perfluoroalkylsilanes increased in proportion to the duration over which the so...

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Bibliographic Details
Main Authors Lee, Austin W. H, Pilapil, Brandy K, Ng, Him Wai, Gates, Byron D
Format Journal Article
LanguageEnglish
Published 22.01.2015
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Summary:We demonstrate the use of microwave radiation as a tool to accelerate the formation of perfluoroalkylsilane based self-assembled monolayers (SAMs) on silicon oxide surfaces. Surface coverage of these SAMs of monoreactive perfluoroalkylsilanes increased in proportion to the duration over which the solutions were heated by microwave radiation. We demonstrate the use of microwave radiation as a tool to accelerate the formation of perfluoroalkylsilane based self-assembled monolayers (SAMs) on silicon oxide surfaces.
Bibliography:10.1039/c4cc07494g
Electronic supplementary information (ESI) available: Experimental methods, AFM images of clean silicon substrate, XPS survey scan. See DOI
ISSN:1359-7345
1364-548X
DOI:10.1039/c4cc07494g