Polymorphism stabilization by crystal adsorption on a self-assembled monolayerElectronic supplementary information (ESI) available: XRD, AFM, DSC, XPS and SEM images. See DOI: 10.1039/c3ce41237g

The control over crystal polymorphism is a well-established subject in crystallization and materials chemistry. In recent years, self-assembled monolayers (SAMs) with different functionalized groups have been used as a new chemical approach to control crystal nucleation and polymorphism. In this pap...

Full description

Saved in:
Bibliographic Details
Main Authors Moshe, Hagay, Levi, Gila, Mastai, Yitzhak
Format Journal Article
LanguageEnglish
Published 21.10.2013
Online AccessGet full text
ISSN1466-8033
DOI10.1039/c3ce41237g

Cover

Loading…
More Information
Summary:The control over crystal polymorphism is a well-established subject in crystallization and materials chemistry. In recent years, self-assembled monolayers (SAMs) with different functionalized groups have been used as a new chemical approach to control crystal nucleation and polymorphism. In this paper, we focus on a study of the different mechanisms involved in polymorphism control by crystallization onto SAMs. We study the crystallization of l -glutamic acid on SAMs with various functionalized end groups: R-OH, R-CH 3 and R-COOH. Furthermore, in this work we select crystallization conditions in which we can identify different mechanisms of polymorphism stabilization and show that functionalized SAMs can be used to stabilize crystal polymorphism by means of crystal adsorption from the crystallization solution onto SAMs, and not merely by nucleation and crystal growth onto the SAMs. In this paper, we focus on a study of the different mechanisms involved in polymorphism control by crystallization onto SAMs and it is shown that functionalized SAMs can be used to stabilize crystal polymorphism by means of crystal adsorption from the crystallization solution onto the SAMs, and not merely by nucleation and crystal growth onto the SAMs.
Bibliography:10.1039/c3ce41237g
Electronic supplementary information (ESI) available: XRD, AFM, DSC, XPS and SEM images. See DOI
ISSN:1466-8033
DOI:10.1039/c3ce41237g