Photolabile protecting groups in metalorganic frameworks: preventing interpenetration and masking functional groupsThis article is part of the ChemComm Emerging Investigators 2012 themed issue.Electronic supplementary information (ESI) available: Full details of ligand and MOF synthesis and characterization, photolysis reactions, TGA, crystallography, and gas sorption experiments. CCDC 826054 and 826055. For ESI and crystallographic data in CIF or other electronic format see DOI: 10.1039/c1cc128

Photolabile groups can be incorporated into metalorganic frameworks (MOFs) and then quantitatively cleaved following MOF formation. Here, a 2-nitrobenzyl ether prevents lattice interpenetration (catenation) in a cubic MOF derived from zinc( ii ). Subsequent photolysis unmasks a hydroxyl group, and p...

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Bibliographic Details
Main Authors Deshpande, Rajesh K, Waterhouse, Geoffrey I. N, Jameson, Geoffrey B, Telfer, Shane G
Format Journal Article
LanguageEnglish
Published 11.01.2012
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Summary:Photolabile groups can be incorporated into metalorganic frameworks (MOFs) and then quantitatively cleaved following MOF formation. Here, a 2-nitrobenzyl ether prevents lattice interpenetration (catenation) in a cubic MOF derived from zinc( ii ). Subsequent photolysis unmasks a hydroxyl group, and produces an open MOF that cannot be synthesized directly. A 2-nitrobenzyl ether protects a hydroxyl functional group and prevents lattice interpenetration in a cubic MOF derived from zinc( ii ).
Bibliography:For ESI and crystallographic data in CIF or other electronic format see DOI
and
Electronic supplementary information (ESI) available: Full details of ligand and MOF synthesis and characterization, photolysis reactions, TGA, crystallography, and gas sorption experiments. CCDC
This article is part of the
ChemComm
826054
10.1039/c1cc12884a
Emerging Investigators 2012 themed issue.
826055
ISSN:1359-7345
1364-548X
DOI:10.1039/c1cc12884a