Dynamic Adsorption/Desorption of NO x on MFI Zeolites: Effects of Relative Humidity and Si/Al Ratio
Adsorption is a potential technology that is expected to meet NO ultra-low emission standards and achieve the recovery of NO . In this study, the adsorption/desorption behavior of NO with competitive gases (e.g., H O(g) and CO ) was studied on MFI zeolites with different Si/Al ratios and under diffe...
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Published in | Nanomaterials (Basel, Switzerland) Vol. 13; no. 1 |
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Main Authors | , |
Format | Journal Article |
Language | English |
Published |
Switzerland
29.12.2022
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Subjects | |
Online Access | Get full text |
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Summary: | Adsorption is a potential technology that is expected to meet NO
ultra-low emission standards and achieve the recovery of NO
. In this study, the adsorption/desorption behavior of NO
with competitive gases (e.g., H
O(g) and CO
) was studied on MFI zeolites with different Si/Al ratios and under different relative humidity (0~90% RH). Sample characterization of self-synthesizing zeolites was conducted by means of X-ray diffraction, Ar adsorption-desorption, and field emission scanning electron microscopy. The results showed that low-silica HZSM-5(35) showed the highest NO
adsorption capacity of 297.8 μmol/g (RH = 0) and 35.4 μmol/g (RH = 90%) compared to that of other adsorbents, and the efficiency loss factor of NO
adsorption capacity at 90%RH ranged from 85.3% to 88.1%. A water-resistance strategy was proposed for NO
multicomponent competitive adsorption combined with dynamic breakthrough tests and static water vapor adsorption. The presence of 14% O
and lower adsorption temperature (25 °C) favored NO
adsorption, while higher CO
concentrations (~10.5%) had less effect. The roll-up factor (
) was positively correlated with lower Si/Al ratios and higher H
O(g) concentrations. Unlike Silicalite-1, HZSM-5(35) exhibited an acceptable industrial desorption temperature window of NO
(255~265 °C). This paper aims to provide a theoretical guideline for the rational selection of NO
adsorbents for practical applications. |
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ISSN: | 2079-4991 2079-4991 |