Structure and Magnetic Properties of Thin Permalloy Films Near the aTranscriticala State

Various series of permalloy thin films were grown by dc-sputtering on Si (100) and glass substrates at room temperature and different argon pressure values using a Fe 20 Ni 80 target. The increase of argon pressure leads to a decrease of the Fe concentration in the films from 17 at.% to 15 at.%, an...

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Bibliographic Details
Published inIEEE transactions on magnetics Vol. 46; no. 2; pp. 333 - 336
Main Authors Svalov, A V, Aseguinolaza, IR, Garcia-Arribas, A, Orue, I, Barandiaran, J M, Alonso, J, FernAndez-Gubieda, M L, Kurlyandskaya, G V
Format Journal Article
LanguageEnglish
Published 01.02.2010
Subjects
Argon
Iron
Permalloy
Roughness
Silicon substrates
Surface layer
Texture
Thin films
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Summary:Various series of permalloy thin films were grown by dc-sputtering on Si (100) and glass substrates at room temperature and different argon pressure values using a Fe 20 Ni 80 target. The increase of argon pressure leads to a decrease of the Fe concentration in the films from 17 at.% to 15 at.%, an increase of the root mean square roughness of film surfaces, and a decrease of the sharpness of the crystalline texture of the samples. The increase of the film thickness leads to an increase of the coercive field. The transition to the "transcritical" state was observed at a critical thickness that decreases from 220 to 50 nm as the argon pressure in the chamber increases. This state was confirmed by the characteristic shapes of hysteresis loops, rotatable magnetic anisotropy, and the appearance of stripe domains.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
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ObjectType-Feature-1
ISSN:0018-9464
1941-0069
DOI:10.1109/TMAG.2009.2032519