Unstressed carbon-metal films deposited by the rmionic vacuum arc method

• Published in: Journal of Optoelectronics and Advanced Materials Vol. 8; no. 1; pp. 74 - 77
• Main Authors: Lungu, C P, Mustata, I, Musa, G, Lungu, A M, Brinza, O, Moldovan, C, Rotaru, C, Iosub, R, Sava, F, Popescu, M, Vladoiu, R, Ciupina, V, Prodan, G, Apetroaei, N
• Format: Journal Article
• Language: English
• Published: 01.02.2006

A novel method based on thermo-ionic vacuum arc plasma was developed to grow metal-carbon zero stress films for MEMS applications. The method chosen to prepare metal-carbon films uses an electron beam emitted by an externally heated cathode accelerated by a high anodic voltage. Applying a high volta...