Unstressed carbon-metal films deposited by the rmionic vacuum arc method

• Published in: Journal of Optoelectronics and Advanced Materials Vol. 8; no. 1; pp. 74 - 77
• Main Authors: Lungu, C P, Mustata, I, Musa, G, Lungu, A M, Brinza, O, Moldovan, C, Rotaru, C, Iosub, R, Sava, F, Popescu, M, Vladoiu, R, Ciupina, V, Prodan, G, Apetroaei, N
• Format: Journal Article
• Language: English
• Published: 01.02.2006
• ISSN: 1454-4164

A novel method based on thermo-ionic vacuum arc plasma was developed to grow metal-carbon zero stress films for MEMS applications. The method chosen to prepare metal-carbon films uses an electron beam emitted by an externally heated cathode accelerated by a high anodic voltage. Applying a high voltage (1-6 kV) between cathode and anode bright plasma was ignited in carbon atoms. In order to minimize the internal stress and to get films with increased adherence, interlayer and graded interlayer with Fe, Cr, Al and Ni was deposited. The prepared films were characterized by XPS, XRD, AFM and ellipsometry.