Implementation of sub-Rayleigh-resolution lithography using an N-photon absorber

A nonlinear optical, phase-shifted-grating method for improving the resolution of feature sizes is implemented experimentally using an N-photon lithographic material. For the recording medium, we used poly(methyl-methacrylate) (PMMA), which is a UV lithographic material that can be excited by multi-...

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Published inJournal of modern optics Vol. 53; no. 16-17; pp. 2271 - 2277
Main Authors Chang, Hye Jeong, Shin, Heedeuk, O'Sullivan-Hale, Malcolm N, Boyd, Robert W
Format Journal Article
LanguageEnglish
Published 10.11.2006
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Summary:A nonlinear optical, phase-shifted-grating method for improving the resolution of feature sizes is implemented experimentally using an N-photon lithographic material. For the recording medium, we used poly(methyl-methacrylate) (PMMA), which is a UV lithographic material that can be excited by multi-photon absorption in the visible region. We achieved a two-fold enhancement of the resolution over the standard Rayleigh limit of half of the wavelength.
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ISSN:0950-0340
1362-3044
DOI:10.1080/09500340408956561