Synergistic effect of Si concentration and distribution on ferroelectric properties optimization of Si:HfO2ferroelectric thin films

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Bibliographic Details
Published inJournal of physics. Condensed matter Vol. 34; no. 41
Main Authors Shao, Yanping, Yang, Wanting, Wang, Yuanyao, Deng, Yuhui, Liao, Ningtao, Zhu, Bingyan, Lin, Xin, Jiang, Limei, Jiang, Jie, Yang, Qiong, Zhong, Xiangli
Format Journal Article
LanguageEnglish
Published 04.08.2022
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ISSN:1361-648X
DOI:10.1088/1361-648X/ac8513